Saturday, July 23, 2011

PEMBUATAN PADUAN (Ti1-xAlx)N DENGAN TEKNIK PLASMA CVD DARI BUBUK AlCl3, GAS N2 DAN H2, SERTA LARUTAN TiCl4

K. Moto

Abstract: The substitution of Ti atoms by Al atoms in TiN lattice sites to form (Ti1-xAlx)N is clearly demonstrated by the coatings which were deposited on steel substrate and using plasma CVD technique. The presence of Al atoms in TiN lattice site is shown by means of XRD and EDX techniques: lattice parameters decreasing of TiN as the fraction of Al increases (XRD) and precipitation of hexagonal AlN phase (XRD) as the fraction of Al exceeding 0.8 (EDX). The hardness of these coating are just around 30 GPa, which is beyond the values reported in literatures.

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